纳米结构黑镍薄膜的电沉积机理.pdf

47 1 2011 1 123—128 ACTA METALLURGICA SINICA Jan. 2011 –128 ?( , 310027) Watt , SEM XRD , . , , ; 3D / ; ( ) , Ni UPD / / , R t ; , H (H 2 ) ( ) , EIS . , , , O646 A 0412 ? 1961(2011)01 ? 0123 ? 06 ELECTROPLATING MECHANISM OF NANOSTRUC- TURED BLACK Ni FILMS SONG Lixiao, ZHANG Zhao, ZHANG Jianqing, CAO Chunan Department of Chemistry, Zhejiang University, Hangzhou 310027 Correspondent: ZHANG Zhao, professor, Tel: (0571)85615190 , E-mail: ******@. Supported by National Natural Science Foundation of China (Nos. 50771092 and 21073162 ) Manuscript received 2010–06–08, in revised form 2010–08–13 ABSTRACT Nanocrystalline black nickel ?lm has been obtained from a modi?ed Watt bath by using DC (direct current) electroplating method, and characterized by using SEM and XRD. Mean- while, the initial electroplating behavior of the nanocrystalline black Ni ?lm was investigated using cyclic voltammetry (CV) and electrochemical impeda nce spectroscopy (EIS). The results showed that the black Ni ?lm is substantially smooth and bright, and consists of particles with the mean size nm. The deposition of black Ni ?lm followed the mechanism of three–dimensional (3D) nucleation and subsequent grain growth. With the increase of the negative potential bias, the main deposition process of black Ni ?lm onto brass changed from the under–potential deposition (UPD) through