relative stability of ternary adsorption sites on (111) fcc and (0001) hcp transition-metal surfaces：三元吸附位点的相对稳定性（111）fcc和hcp（0001）过渡金属表面文献.pdf

A429 Surface Science 287/288 (1993) 946-949 North-Holland Relative stability of ternary adsorption sites on (111) fcc and (0001) hcp transition-metal surfaces B. Piveteau a, D. Spanjaard b and . Desjonqu~res a a CEA, CE Saclay, DSM, DRECAM, SRSIM, 91191 Gif-sur-Yvette Cedex, France b Laboratoire de Physique des Solides, B~timent 510, Universit~ Paris-Sud, 91405 Orsay Cedex, France Received 27 July 1992; accepted for publication 14 October 1992 In order to shed some light on the problem of crystal growth we here present a theoretical study of the relative stability of ternary adsorption sites on a close-packed surface of a hcp or fcc transition metal. We find that on Ir(111) the relative stability of the normal and fault sites varies with the nature of the adatom, which is in very good agreement with experiments: a single Ir adatom prefers the fault site, while an adatom with a larger d-band filling is more stable at a normal site. A similar calculation is carried out on Ru(0001) and predictions are made concerning the relative stability of these two adsorption sites. Surface Science 287/288 (1993) 950-954 North-Holland Growth of Au on Cu(001) studied by full hemispherical photoelectron diffraction D. Naumovid, J. Osterwalder, A. Stuck, P. Aebi and L. Schlapbach Institut de Physique, Universit~ de Fribourg, CH-1700 Fribourg, Switzerland Received 1 Septembe